Hong Kong AI Science Week: ArtX Hong Kong Forum

Unlocking Hong Kong's Art X Tech Edge: Strengths, Gaps & Future Strategies

On 18 December 2025, “Hong Kong AI Science Week: ArtX Hong Kong Forum” was held at the CityUHK Alumni Lounge, International Centre, City University of Hong Kong (CityUHK). As part of the Hong Kong International AI Art Festival, the forum focused on exploring the development of the ecosystem of the next-generation creative economy. Centered around five key themes—"Art, Technology, Trade, Creative IP and Innovation"—the forum invited speakers from diverse industries and fields to share research findings and offer insights into the future trajectory of the creative industry.

The panelists for this forum included (listed in alphabetical order of last names): Professor Maybo Ching, Professor of History and Head of the Department of Chinese and History, CityUHK; Professor Tianxiang He, Associate Professor at the School of Law, CityUHK; Professor Tobias Klein, Associate Professor at the School of Creative Media, CityUHK; Professor Haoliang Li, Assistant Professor at the Department of Electrical Engineering, CityUHK; Professor Wen Jung Li, Vice‑President (Talent and International Strategy) and Chair Professor of Biomedical Engineering in the Department of Mechanical Engineering, CityUHK; Professor Fen Jennifer Lin, Associate Vice‑President (Global Strategy) and Professor at the Department of Media and Communication, CityUHK; Professor Xiaofan Liu, Associate Professor at the Department of Media and Communication, CityUHK; Ms. Elaine Wang, Director of Business Development at Kwai Fung Hin Art Gallery; Mr. Vincent Wu, founder and CEO of CURATOR Group; and Professor Alvin Yip, Director of the Indra and Harry Banga Gallery, CityUHK.

Through in-depth dialogues and insights shared among the speakers, the forum demonstrated how artificial intelligence and emerging technologies are reshaping the production, protection, and trade of creative content, while also establishing an inspiring bridge for dialogue among artists, technologists, and industry pioneers.